Rohit Grover

Title: Rohit Grover: Innovator in Semiconductor Technology

Introduction

Rohit Grover is a prominent inventor based in West Linn, Oregon. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to solving complex engineering challenges.

Latest Patents

One of Rohit Grover's latest patents focuses on using materials with different etch rates to fill trenches in semiconductor devices. This invention includes a metal interconnect structure that comprises a dielectric layer on a substrate, an opening in the dielectric layer, and multiple atomic layer deposition (ALD) layers. These layers work together to enhance the performance and reliability of semiconductor devices.

Another notable patent involves technology for selectively etching titanium and titanium nitride in the presence of other materials. This method allows for the precise removal of titanium nitride and titanium while preserving other materials such as dielectric materials and oxides. This innovation is crucial for improving the manufacturing processes in semiconductor fabrication.

Career Highlights

Rohit Grover is currently employed at Intel Corporation, where he continues to push the boundaries of semiconductor technology. His work at Intel has positioned him as a key player in the development of advanced materials and processes that are essential for modern electronics.

Collaborations

Rohit has collaborated with talented coworkers such as Sridhar Govindaraju and Anindya Dasgupta. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Rohit Grover's contributions to semiconductor technology through his patents and work at Intel Corporation highlight his role as an influential inventor in the field. His innovative solutions are paving the way for advancements in electronics and semiconductor manufacturing.