Company Filing History:
Years Active: 2017-2022
Title: Roger Louis Alvis: Innovator in Wafer Defect Inspection
Introduction
Roger Louis Alvis is a notable inventor based in Beaverton, OR (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of wafer defect inspection. With a total of 4 patents to his name, Alvis has developed innovative methods that enhance the accuracy and efficiency of defect characterization.
Latest Patents
One of Alvis's latest patents is titled "Method and system for wafer defect inspection." This invention involves a comprehensive approach to locating and characterizing defects on a substrate. The method includes performing an initial scan to create a defect map, followed by a second scan of specific regions to produce electron channeling contrast (ECC) images. These images are crucial for determining the coordinates of defects and directing an ion beam for substrate milling. Another significant patent is "Tomography-assisted TEM prep with requested intervention automation workflow." This process improves lamella thinning and endpointing by utilizing automated small angle tilts, allowing for more precise feature depth analysis and user intervention based on analyzed images.
Career Highlights
Alvis has built a career focused on advancing semiconductor inspection technologies. His work at Fei Company has positioned him as a key player in the industry, where he continues to innovate and push the boundaries of defect inspection methodologies.
Collaborations
Throughout his career, Alvis has collaborated with talented individuals such as Trevan R Landin and Greg Clark. These partnerships have contributed to the development of cutting-edge technologies in the field.
Conclusion
Roger Louis Alvis is a distinguished inventor whose work in wafer defect inspection has made a significant impact on semiconductor technology. His innovative patents and collaborative efforts continue to shape the future of the industry.