Company Filing History:
2 out of 445 
1 out of 1,874 
1 out of 159 
Years Active: 1981-2004
Title: The Innovations of Rodney H Moss
Introduction
Rodney H Moss is a notable inventor based in Felixstowe, GB. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on enhancing semiconductor substrates and structures, which has implications for various electronic applications.
Latest Patents
One of Moss's latest patents involves semiconductor substrates and structures. This innovation describes an oxide layer on an indium phosphide semiconductor substrate that is doped with silicon. This process enables the deposition of epitaxial layers upon the substrate in a conventional manner, including mesa etching and overgrowth, to form a semiconductor structure. The doped oxide layer is believed to reduce the diffusion of phosphorus out of the substrate, thereby minimizing zinc levels in the active region of the structure. Additionally, after mesa etching, oxide can be formed on the mesa sides and then doped with silicon. Conventional blocking layers can then be formed over the doped oxide, which reduces the diffusion of zinc from the blocking layers into the rest of the structure. Another patent focuses on a method of providing a reagent into a chemical process, where the provision is in the vapor phase and at a controlled mass flow rate.
Career Highlights
Throughout his career, Rodney H Moss has worked with prominent organizations, including British Telecommunications Corporation and British Telecommunications Public Limited Company. His experience in these companies has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Moss has collaborated with notable colleagues such as Marc M Faktor and Paul C Spurdens. These partnerships have contributed to the advancement of his research and inventions.
Conclusion
Rodney H Moss is a distinguished inventor whose work in semiconductor technology has led to several important patents. His contributions continue to influence the field and pave the way for future innovations.