The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 1981

Filed:

Mar. 06, 1979
Applicant:
Inventors:

John Haigh, Ipswich, GB;

Marc M Faktor, Bushey Heath, GB;

Rodney H Moss, Felixstowe, GB;

Assignee:

Post Office, London, GB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B05C / ;
U.S. Cl.
CPC ...
118 64 ; 118412 ; 118415 ;
Abstract

Semiconductor compounds which are alloys of group III-V compounds are grown by a liquid phase epitaxy method which includes heating growth apparatus in a reducing atmosphere while maintaining a solvent for the compound, a source of the group III-V compound and another element of the alloy separate from each other. After heating to reduce oxides, the element is added to the solvent, the source is brought into contact with the solvent and the resulting solution is brought into contact with a substrate to effect growth of the compound. Apparatus for carrying out the method is also described.


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