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For the Inventor, By the Inventor

Pleasanton, CA, United States of America

Roderick Craig Mosely

This inventor holds 51 USPTO granted patents and 3 published patent applications, plus 2 CIPO patents and 1 EPO patent, primarily in Plasma Sputtering (CPC class 4386). Top assignees: Applied Materials, Inc., Jennings Technology, Thomas & Betts International LLC. Active years: 1988-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Roderick Craig Mosely. Retrieved from https://idiyas.com/inventor/roderick-craig-mosely

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 51 

% Patents Active = 80.4



Average Co-Inventor Count = 4.3

ph-index = 23

Forward Citations = 3,292(Granted Patents)

Forward Citations (Not Self Cited) = 3,245(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Mountain View, CA (US) (1988 - 1995)
  • Pheasanton, CA (US) (2000)
  • Pleasanton, CA (US) (1997 - 2018)

Company Filing History:

goldMedal41 out of 14,454 
 
Applied Materials, Inc.
 patents
silverMedal3 out of 6 
 
Jennings Technology
 patents
bronzeMedal3 out of 715 
 
Thomas & Betts International LLC
 patents
4. 2 out of 22 
 
Machine Technology, Inc.
 patents
5. 2 out of 834,513 
Other
 patents

Years Active: 1988-2018

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Areas of Expertise:
Self-Ionized Plasma
Inductively-Coupled Plasma
ALD Tantalum Nitride
Copper Metallization
High Pressure Detection
Chemical Vapor Deposition
Metal Interconnects
Dual Damascene
Sputtering
Reactive Preclean
Thin Films
Vacuum Switching
51 patents (USPTO):Explore Patents
1. 10047430 - Self-ionized and inductively-coupled plasma for sputtering and resputtering (2018-08-14),
2. 8696875 - Self-ionized and inductively-coupled plasma for sputtering and resputtering (2014-04-15),
3. 8668816 - Self-ionized and inductively-coupled plasma for sputtering and resputtering (2014-03-11),
4. 8324095 - Integration of ALD tantalum nitride for copper metallization (2012-12-04),
5. 7802480 - Method and apparatus for the detection of high pressure conditions in a vacuum-type electrical device (2010-09-28),
6. 7604708 - Cleaning of native oxide with hydrogen-containing radicals (2009-10-20),
7. 7499255 - Vacuum-type electrical switching apparatus (2009-03-03),
8. 7497122 - Method and apparatus for the detection of high pressure conditions in a vacuum-type electrical device (2009-03-03),
9. 7383733 - Method and apparatus for the sonic detection of high pressure conditions in a vacuum switching device (2008-06-10),
10. 7313964 - Method and apparatus for the detection of high pressure conditions in a vacuum-type electrical device (2008-01-01),
11. 7302854 - Method and apparatus for the detection of high pressure conditions in a vacuum-type electrical device (2007-12-04),
12. 7049226 - Integration of ALD tantalum nitride for copper metallization (2006-05-23),
13. 7048837 - End point detection for sputtering and resputtering (2006-05-23),
14. 6933021 - Method of TiSiN deposition using a chemical vapor deposition (CVD) process (2005-08-23),
15. 6905965 - Reactive preclean prior to metallization for sub-quarter micron application (2005-06-14),

Title: Inventor Spotlight: Roderick Craig Mosely

Introduction:

Roderick Craig Mosely is a renowned inventor based in Pleasanton, CA, with an impressive portfolio of 51 patents to his name. His expertise lies in the field of sputtering deposition materials, particularly focusing on innovative technologies such as self-ionized plasma (SIP) and inductively coupled plasma (ICP) sputtering.

Latest Patents:

One of Mosely's latest patents includes a novel approach to sputtering and resputtering using self-ionized and inductively-coupled plasma. This technology involves utilizing a magnetron sputter reactor for depositing materials like tantalum, tantalum nitride, and copper. The method allows for the promotion of SIP and ICP sputtering, either concurrently or alternately, in the same or different chambers, enhancing the efficiency and quality of thin film deposition processes.

Career Highlights:

Mosely has made significant contributions to the industry during his tenure at companies such as Applied Materials, Inc. and Thomas & Betts International LLC. His innovative solutions and problem-solving skills have propelled him to the forefront of technological advancements in sputtering deposition techniques.

Collaborations:

Throughout his career, Mosely has collaborated with esteemed colleagues such as Ted Tie Guo and Liang-Yuh Chen. These collaborations have led to the development of cutting-edge technologies and have established Mosely as a key figure in the field of sputtering deposition materials.

Conclusion:

In conclusion, Roderick Craig Mosely's inventive spirit and dedication to pushing the boundaries of sputtering technologies have cemented his reputation as a visionary inventor. With a vast patent portfolio and a history of successful collaborations, Mosely continues to shape the future of thin film deposition processes with his groundbreaking innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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