The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2009
Filed:
Feb. 12, 2004
Bingxi Sun Wood, Stanford, CA (US);
Mark N. Kawaguchi, Palo Alto, CA (US);
James S. Papanu, San Rafael, CA (US);
Roderick C. Mosely, Pleasanton, CA (US);
Chiukun Steven Lai, Sunnyvale, CA (US);
Chien-teh Kao, Sunnyvale, CA (US);
Hua Ai, Mountain View, CA (US);
Wei W. Wang, Santa Clara, CA (US);
Bingxi Sun Wood, Stanford, CA (US);
Mark N. Kawaguchi, Palo Alto, CA (US);
James S. Papanu, San Rafael, CA (US);
Roderick C. Mosely, Pleasanton, CA (US);
Chiukun Steven Lai, Sunnyvale, CA (US);
Chien-Teh Kao, Sunnyvale, CA (US);
Hua Ai, Mountain View, CA (US);
Wei W. Wang, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a substrate support, an ion filter to filter the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio, and a gas distributor to introduce the filtered energized gas into the chamber.