Lebanon, OR, United States of America

Rocky H Knuth

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2005.

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovations by Rocky H Knuth

Introduction

Rocky H Knuth is an accomplished inventor based in Lebanon, Oregon. He has made significant contributions to the field of substrate technology, particularly through his innovative patent.

Latest Patents

Rocky H Knuth holds a patent for "Substrates having features formed therein and methods of forming." This patent describes embodiments related to substrates with features formed within them and outlines methods for creating these features. One exemplary method involves forming a blind feature through a majority of the substrate's thickness, defined by at least one sidewall surface and a bottom surface. The method also includes applying an etch-resistant material to the blind feature and removing it from part of the bottom surface. Furthermore, the method entails wet etching the substrate through the bottom surface to create a through feature across the substrate's thickness. He has 1 patent to his name.

Career Highlights

Rocky H Knuth is associated with Hewlett-Packard Development Company, L.P., where he has been able to apply his expertise in substrate technology. His work has contributed to advancements in the field, showcasing his innovative approach to problem-solving.

Collaborations

Some of his notable coworkers include Siddhartha Bhowmik and Rio Rivas, who have collaborated with him on various projects within the company.

Conclusion

Rocky H Knuth's contributions to substrate technology through his patent demonstrate his innovative spirit and commitment to advancing the field. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
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