The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2005
Filed:
May. 26, 2004
Siddhartha Bhowmik, Salem, OR (US);
Rio T. Rivas, Corvallis, OR (US);
Mark C. Huth, Corvallis, OR (US);
Rocky H. Knuth, Lebanon, OR (US);
Siddhartha Bhowmik, Salem, OR (US);
Rio T. Rivas, Corvallis, OR (US);
Mark C. Huth, Corvallis, OR (US);
Rocky H. Knuth, Lebanon, OR (US);
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Abstract
The described embodiments relate to substrates having features formed therein and methods of forming same. One exemplary method forms a blind feature through a majority of a thickness of a substrate, the blind feature being defined by at least one sidewall surface and a bottom surface. The method also applies an etch resistant material to the blind feature and removes the etch resistant material from at least a portion of the bottom surface. The method further wet etches the substrate at least through the bottom surface sufficient to form a through feature through the thickness of the substrate.