Palo Alto, CA, United States of America

Robert Willoner

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2025.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Robert Willoner

Introduction

Robert Willoner is a notable inventor based in Palo Alto, California. He has made significant contributions to the field of semiconductor technology. His work focuses on developing advanced deposition tools that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Willoner holds a patent for a "Deposition tool and method for filling deep trenches." This patent describes a semiconductor deposition tool that includes a specimen support, at least one ion gun directed at a specimen, and at least one electron beam gun. The innovative design positions the electron beam guns, sources, and ion beam guns below the specimen support, allowing for precise material deposition in deep trenches.

Career Highlights

Throughout his career, Robert Willoner has been associated with Intel Corporation, a leading company in semiconductor manufacturing. His expertise in deposition tools has contributed to advancements in the industry, particularly in the area of trench filling techniques.

Collaborations

Willoner's work at Intel Corporation has likely involved collaborations with other engineers and researchers in the field. These partnerships are essential for driving innovation and improving semiconductor technologies.

Conclusion

Robert Willoner's contributions to semiconductor technology through his innovative patent demonstrate his commitment to advancing the industry. His work continues to influence the development of efficient manufacturing processes in the semiconductor sector.

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