Company Filing History:
Years Active: 2004
Title: Innovations of Robert Turklot
Introduction
Robert Turklot is an accomplished inventor based in Hillsboro, OR (US). He has made significant contributions to the field of integrated circuits, particularly through his innovative methods involving polymeric interlayer dielectrics. His work has implications for the advancement of semiconductor technology.
Latest Patents
Turklot holds a patent for a method integrating a polymeric interlayer dielectric in integrated circuits. This method involves forming a dielectric layer comprising a polymer on a conductive layer formed on a substrate. A sacrificial hard mask is then created on the dielectric layer. Following this, a first photoresist layer is patterned on the sacrificial hard mask to define a first etched region, which is formed through the dielectric layer while substantially all of the first photoresist layer is removed. A sacrificial fill layer then covers the sacrificial hard mask and fills the first etched region. Finally, a second photoresist layer is patterned over the sacrificial fill layer to define a second etched region, which is formed through the sacrificial fill layer and the dielectric layer while substantially all of the second photoresist layer and the sacrificial fill layer are simultaneously removed. This innovative approach enhances the efficiency and performance of integrated circuits.
Career Highlights
Turklot is currently employed at Intel Corporation, a leading technology company known for its advancements in semiconductor manufacturing. His role at Intel has allowed him to work on cutting-edge technologies that shape the future of electronics.
Collaborations
Throughout his career, Turklot has collaborated with notable colleagues, including Makarem A Hussein and Ruth Amy Brain. These collaborations have fostered an environment of innovation and creativity, contributing to the success of their projects.
Conclusion
Robert Turklot's contributions to the field of integrated circuits through his innovative patent demonstrate his expertise and commitment to advancing technology. His work at Intel Corporation and collaborations with esteemed colleagues further highlight his impact in the industry.