This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Kla Corporation. Active years: 2022.
Company Filing History:
Years Active: 2022
Title: The Innovations of Robert Press
Introduction
Robert Press is an accomplished inventor based in San Jose, California. He has made significant contributions to the field of metrology, particularly in the measurement and control of wafer tilt for X-ray based applications. His innovative work has led to the development of methods and systems that enhance the accuracy of wafer orientation measurements.
Latest Patents
Robert Press holds a patent for "Measurement and control of wafer tilt for x-ray based metrology." This patent describes methods and systems for measuring the orientation of a wafer at or near an X-ray scatterometry measurement location. One notable aspect of his invention is that it includes a wafer orientation measurement system that can measure wafer orientation based on a single measurement without requiring intervening stage moves. In some embodiments, the orientation measurement spot coincides with the X-ray measurement spot, allowing for simultaneous measurements. Additionally, the system employs temporal and spatial filtering to improve tracking and can be calibrated to identify the wafer's orientation concerning an incident X-ray beam.
Career Highlights
Robert Press is currently employed at Kla Corporation, where he continues to innovate in the field of metrology. His work has been instrumental in advancing the capabilities of X-ray scatterometry systems, which are crucial for the semiconductor industry. With a total of 1 patent, he has established himself as a key figure in his area of expertise.
Collaborations
Robert has collaborated with notable colleagues such as Barry Blasenheim and Joseph A Di Regolo. Their combined efforts have contributed to the development of advanced metrology solutions that benefit the industry.
Conclusion
Robert Press is a prominent inventor whose work in wafer tilt measurement has significantly impacted the field of X-ray based metrology. His innovative approaches and collaborations continue to drive advancements in this critical area of technology.