Robert P Ma

Title: Innovations of Robert P. Ma

Introduction

Robert P. Ma is a notable inventor based in Phoenix, AZ (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on advanced methods for manufacturing semiconductor devices, which are crucial for modern electronics.

Latest Patents

One of his latest patents is titled "Method for manufacturing a semiconductor die with multiple depth shallow trench isolation." This patent outlines a method that includes several steps, such as providing a semiconductor substrate, processing it to form shallow trench isolation (STI), and etching the wafer to create silicon trenches with varying depths based on the masking layer. Another significant patent is "Memory cell having an ONO film with an ONO sidewall and method of fabricating same." This invention describes a merged two-transistor memory cell of an EEPROM, which includes a substrate, insulating layer, and a unique ONO stack film that enhances the memory cell's performance.

Career Highlights

Robert P. Ma is currently employed at Microchip Technology Inc., where he continues to innovate in the semiconductor industry. His expertise and inventions have contributed to the advancement of memory technology and semiconductor manufacturing processes.

Collaborations

Some of his notable coworkers include Neil F. Deutscher and Roger D. St. Amand. Their collaborative efforts have likely played a role in the successful development of various technologies within the company.

Conclusion

Robert P. Ma's contributions to semiconductor technology through his patents and work at Microchip Technology Inc. highlight his importance in the field. His innovative methods and collaborative spirit continue to drive advancements in electronics.