Company Filing History:
4 out of 52 
3 out of 21,594 
1 out of 1,360 
Years Active: 2005-2014
Title: Innovations in Microlithography: The Contributions of Robert P. Fabinski
Introduction
Robert P. Fabinski, an accomplished inventor based in Rochester, NY, has made significant strides in the field of microlithography, holding a total of eight patents. His pioneering work has helped shape the landscape of measurement structures and device fabrication, demonstrating a strong commitment to advancing technological capabilities.
Latest Patents
Among his most notable inventions are two patents related to stitching methods using multiple microlithographic exposure tools. The first patent outlines a method for producing a measurement structure that measures the alignment of patterns in multiple layers of patternable material. This innovative approach employs exposure tools with varying resolution limits and maximum expose field sizes. The process includes exposing and stitching an abutting field pattern in a layer of material using a first exposure tool and mask, while simultaneously employing a second exposure tool to create a periphery pattern.
The second patent elaborates on a method for producing a device using similar principles. By exposing and stitching abutting field patterns and periphery patterns in respective layers of material, this invention allows for the complete formation of patterns in the patternable material, improving the efficiency and precision of device fabrication.
Career Highlights
Throughout his career, Fabinski has contributed his expertise to reputable companies such as Truesense Imaging, Inc. and Eastman Kodak Company. His work at these organizations has not only advanced his professional development but has also paved the way for new technologies in imaging and fabrication processes.
Collaborations
Robert P. Fabinski has collaborated with notable professionals in the field, including Shen Wang and James E. Doran. These collaborations have undoubtedly enriched his inventive contributions, allowing for the sharing of ideas and expertise that help drive innovation in microlithography.
Conclusion
Robert P. Fabinski's contributions to the field of microlithography and his inventive spirit are evident in his impressive portfolio of patents. His significant advancements in stitching methods using multiple exposure tools highlight his role as a key innovator in the industry. As technology continues to evolve, the impact of his work is expected to resonate, inspiring future developments in the realm of microfabrication.