The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Aug. 02, 2011
Robert P. Fabinski, Rochester, NY (US);
Eric J. Meisenzahl, Ontario, NY (US);
James E. Doran, Ontario, NY (US);
Joseph R. Summa, Hilton, NY (US);
Robert P. Fabinski, Rochester, NY (US);
Eric J. Meisenzahl, Ontario, NY (US);
James E. Doran, Ontario, NY (US);
Joseph R. Summa, Hilton, NY (US);
Truesense Imaging, Inc., Rochester, NY (US);
Abstract
A method for producing a device in one or more layers of patternable material disposed over a substrate uses multiple exposure tools having different resolution limits and maximum expose field sizes. An abutting field pattern is exposed and stitched in one layer of patternable material using one exposure tool and a first mask. A periphery pattern is then exposed in the same layer or in a different layer of patternable material using a second exposure tool and a second mask. The maximum expose field of the first exposure tool is smaller than a size of the device while the maximum expose field of the second exposure tool is at least as large as, or larger, the size of the device so that the combination of the stitched abutting field pattern and the periphery pattern forms a complete pattern in the patternable material.