James E Doran

Title: The Innovations of James E. Doran in Microlithography

Introduction

James E. Doran, an inventive mind located in Ontario, NY, has made significant contributions to the field of microlithography through his groundbreaking patents. With a total of four patents, Doran's work focuses on innovative stitching methods that enhance the precision and efficiency of pattern formation in manufacturing processes.

Latest Patents

Doran’s latest patents include two notable innovations centered around stitching methods using multiple microlithographic exposure tools. One of these patents describes a method for producing a measurement structure designed to gauge the alignment of patterns formed within one or more layers of patternable material. This method utilizes exposure tools with differing resolution limits and maximum expose field sizes, allowing for greater flexibility and accuracy in the patterning process. The measurement structure consists of multiple complementary parts, enabling precise alignment through an abutting field pattern exposed with the first exposure tool and a second periphery pattern introduced via a second exposure tool.

Additionally, his second patent further develops this technique for producing a device across one or more layers of patternable material laid over a substrate. This method ensures that the stitched abutting field pattern effectively integrates with a periphery pattern to create a comprehensive design, emphasizing the different exposure field sizes of the tools used.

Career Highlights

James E. Doran has established an impressive career with Truesense Imaging, Inc., where he applies his expertise in microlithography. His inventive spirit is evidenced by his four patents, which reflect advancements in the methodologies for utilizing multiple exposure tools, a significant factor in modern manufacturing and device fabrication.

Collaborations

Throughout his career, Doran has collaborated with notable colleagues, including Robert P. Fabinski and Eric J. Meisenzahl. These partnerships have been instrumental in fostering innovation and driving the development of new technologies in the field.

Conclusion

James E. Doran's contributions to microlithography exemplify the essence of innovation in the development of advanced manufacturing techniques. His patented methods not only enhance the precision of pattern formation but also pave the way for future advancements in the industry. As he continues his work at Truesense Imaging, Inc., Doran's impact on the field will likely inspire the next generation of inventors and engineers.