Company Filing History:
Years Active: 2003-2014
Title: The Innovative Contributions of Robert Navasca
Introduction
Robert Navasca is a notable inventor based in Redwood City, California. He has made significant contributions to the field of thermal processing technology. With a total of 4 patents to his name, Navasca's work focuses on improving gas flow distribution in thermal reactors.
Latest Patents
One of Navasca's latest patents is a thermal reactor designed with improved gas flow distribution. This invention provides an apparatus and method for enhancing gas distribution during thermal processing. The apparatus includes a chamber body that defines a processing volume, a substrate support that is configured to support and rotate the substrate, and a gas inlet assembly that supplies a first gas flow to the processing volume. Additionally, an exhaust assembly is coupled to the outlet of the chamber body, with both the gas inlet and exhaust assemblies positioned on opposite sides of the chamber body. This innovative design allows for an exhaust volume that extends the processing volume, thereby optimizing the thermal processing efficiency.
Career Highlights
Navasca has built a successful career at Applied Materials, Inc., where he has been instrumental in developing advanced technologies for the semiconductor industry. His expertise in thermal processing has positioned him as a key player in the field.
Collaborations
Throughout his career, Navasca has collaborated with several talented individuals, including Ming-Kuei (Michael) Tseng and Norman L. Tam. These collaborations have further enriched his work and contributed to the advancement of thermal processing technologies.
Conclusion
Robert Navasca's innovative contributions to thermal processing technology demonstrate his commitment to enhancing efficiency in the industry. His patents reflect a deep understanding of the complexities involved in gas flow distribution, making him a valuable inventor in his field.
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