Chatham, NJ, United States of America

Robert McLemore Fleming



Average Co-Inventor Count = 4.2

ph-index = 5

Forward Citations = 154(Granted Patents)


Company Filing History:


Years Active: 1997-2003

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7 patents (USPTO):Explore Patents

Title: The Innovations of Robert McLemore Fleming

Introduction

Robert McLemore Fleming is a notable inventor based in Chatham, NJ (US). He holds a total of 7 patents that showcase his contributions to the field of microelectronics. His work primarily focuses on improving the properties of gate dielectrics and thin films used in various electronic applications.

Latest Patents

Fleming's latest patents include advancements in MOS transistors with improved gate dielectrics. The specification describes silicon MOS devices with gate dielectrics composed of Ta Al O, Ta Si O, and Ta Al Si O. These materials provide enhanced dielectric properties compared to standard SiO gate dielectrics and remain amorphous at high temperatures. This characteristic helps to prevent the formation of SiO interfacial layers, which can negatively impact the effectiveness of high dielectric materials. Another significant patent involves the deposition and annealing of multicomponent ZrSnTi and HfSnTi oxide thin films using a solventless liquid mixture of precursors. This innovative process allows for the deposition of complex mixed metal thin films through methods such as direct liquid injection and aerosol delivery, which can lead to improved electrical properties in microelectronics device fabrication.

Career Highlights

Throughout his career, Fleming has worked with prominent companies such as Lucent Technologies Inc. and Agere Systems Inc. His experience in these organizations has contributed to his expertise in the field of microelectronics and materials science.

Collaborations

Fleming has collaborated with notable coworkers, including Lynn Frances Schneemeyer and Robert Bruce Van Dover. These partnerships have likely enriched his research and development efforts.

Conclusion

Robert McLemore Fleming's innovative work in the field of microelectronics has led to significant advancements in gate dielectrics and thin film technologies. His contributions continue to influence the industry and pave the way for future developments.

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