Beaverton, OR, United States of America

Robert J Patterson


Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 158(Granted Patents)


Company Filing History:


Years Active: 1992-1993

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3 patents (USPTO):Explore Patents

Title: Robert J. Patterson: Innovator in Dielectric Technology

Introduction

Robert J. Patterson, a distinguished inventor based in Beaverton, OR, has made significant contributions to the field of semiconductor technology. With a total of three patents to his name, Patterson specializes in innovative processes that enhance the efficiency and quality of dielectric layers in semiconductor devices.

Latest Patents

Patterson's most recent patents showcase his expertise in filling submicron spaces and optimizing the planarization of dielectrics. One notable invention is a process for filling submicron, high aspect ratio gaps that may have reentrant angles, using a high-quality interlayer dielectric (ILD). This method involves depositing a first ILD layer through Plasma-Enhanced Chemical Vapor Deposition (PECVD), followed by medium-pressure sputter etching to refine the edges and effectively fill the gaps. The process concludes with the deposition of a second ILD layer, ensuring complete gap filling, enhancing the performance of semiconductor devices.

Additionally, Patterson developed an apparatus for planarizing dielectric layers formed over semiconductor substrates. In this innovative method, the substrate is pressed against an abrasive-coated table, allowing for efficient removal of excess dielectric material. The incorporation of rotational movement during this process, combined with simultaneous cooling of the table and abrasive material, significantly reduces step height variation, demonstrating marked improvements over previous techniques.

Career Highlights

Currently employed at Intel Corporation, Patterson plays an integral role in advancing semiconductor technologies. His background is enriched by practical experience and a deep understanding of the complexities involved in dielectric materials and processes, marking him as a key figure in his field.

Collaborations

Robert J. Patterson has had the opportunity to collaborate with talented colleagues such as Seiichi Morimoto and Ebrahim Andideh. These collaborations have further contributed to his innovative approaches and solutions within the semiconductor industry, showcasing the importance of teamwork in technological advancements.

Conclusion

Robert J. Patterson stands out as a prominent inventor in the semiconductor sector, with innovative patents that enhance the manufacturing and performance of dielectric materials. His work demonstrates a commitment to pushing the boundaries of technology, making significant strides in the quest for improved semiconductor efficiency and reliability. As he continues to develop groundbreaking processes, Patterson solidifies his reputation as a thought leader and innovator in the field.

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