This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Innovations in Semiconductor Technology: The Work of Robert H. Olshausen
Introduction: Robert H. Olshausen is a distinguished inventor located in Menlo Park, California, known for his significant contributions to semiconductor technology. With a focus on lithography techniques, Olshausen has made notable advancements that impact the production of high-resolution phase shift masks.
Latest Patents: Olshausen holds a patent for "High resolution phase shift mask," which reveals innovative techniques for fabricating lithography masks. The patent details a two-step process involving lithography and etching to create both mask frames and in-die areas. This invention is crucial for developing semiconductor circuits, particularly those operating at a nanometer scale, such as the 32 nm technology node or smaller. Notably, the mask can achieve a critical dimension bias of less than 20 nm, showcasing its precision.
Career Highlights: Currently, Olshausen is employed at Intel Corporation, where he has been instrumental in driving forward the company’s research and development in semiconductor manufacturing. His work focuses on enhancing the efficiency and capabilities of lithography processes integral to semiconductor design.
Collaborations: Throughout his career, Olshausen has collaborated with talented colleagues, including Chang Ju Choi and Cheng-Hsin Ma. These partnerships have helped foster an environment of innovation, blending various expertise to develop advanced technological solutions in the semiconductor field.
Conclusion: Robert H. Olshausen exemplifies the spirit of innovation in the semiconductor industry. Through his patent work and collaborations at Intel Corporation, he has played a pivotal role in propelling the development of high-resolution lithography masks, which are essential for creating the next generation of semiconductor circuits. His contributions continue to influence the evolution of technology, underscoring the importance of patents in facilitating advancements in various industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile