Company Filing History:

8 out of 3,790

Lam Research Corporation

patents

5 out of 38,057

Micron Technology Incorporated

patents

Years Active: 1996-2009

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7580279 - Flash memory cells with reduced distances between cell elements (2009-08-25),

2. 7563723 - Critical dimension control for integrated circuits (2009-07-21),

3. 7271106 - Critical dimension control for integrated circuits (2007-09-18),

4. 7208407 - Flash memory cells with reduced distances between cell elements (2007-04-24),

5. 7096819 - Inductive plasma processor having coil with plural windings and method of controlling plasma density (2006-08-29),

6. 6716758 - Aspect ratio controlled etch selectivity using time modulated DC bias voltage (2004-04-06),

7. 6583572 - Inductive plasma processor including current sensor for plasma excitation coil (2003-06-24),

8. 6527912 - Stacked RF excitation coil for inductive plasma processor (2003-03-04),

9. 6463875 - Multiple coil antenna for inductively-coupled plasma generation systems (2002-10-15),

10. 6164241 - Multiple coil antenna for inductively-coupled plasma generation systems (2000-12-25),

11. 616424 - Multiple coil antenna for inductively-coupled plasma generation systems (2000-12-26),

12. 6155199 - Parallel-antenna transformer-coupled plasma generation system (2000-12-05),

13. 5589737 - Plasma processor for large workpieces (1996-12-31),

Title: The Innovative Contributions of Robert G Veltrop

Introduction

Robert G Veltrop is a notable inventor based in Boise, ID (US), recognized for his significant contributions to the field of technology. He holds a total of 13 patents, showcasing his expertise and innovative spirit in developing advanced solutions.

Latest Patents

Among his latest patents, Veltrop has developed flash memory cells with reduced distances between cell elements. This invention involves the formation of an anti-reflective coating (ARC) over various layers in the cell fabrication process. The ARC is selectively etched to create sloped edges, which effectively reduce the original photo-defined space. Additionally, he has worked on critical dimension control for integrated circuits. This patent discloses methods for etching substrates with small critical dimensions, utilizing a sulfur oxide-based plasma to etch an amorphous carbon hard mask layer. His innovative techniques allow for the shrinking and enlarging of pattern features, ultimately reducing line edge roughness.

Career Highlights

Veltrop has had a distinguished career, working with prominent companies such as Lam Research Corporation and Micron Technology Incorporated. His experience in these organizations has contributed to his development of cutting-edge technologies and patents.

Collaborations

Throughout his career, Veltrop has collaborated with esteemed colleagues, including Jian J Chen and Thomas E Wicker. These partnerships have fostered an environment of innovation and creativity, leading to the successful development of various technologies.

Conclusion

Robert G Veltrop's contributions to the field of technology through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in integrated circuits and memory technology.

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