Company Filing History:
Years Active: 2018-2021
Title: The Innovative Contributions of Robert Finlay
Introduction
Robert Finlay is an accomplished inventor based in Ballston Lake, NY (US). He holds a total of 3 patents that showcase his expertise in the field of photoresist technology and gas flow process control systems. His work has significantly impacted the semiconductor industry, particularly in enhancing the precision and efficiency of manufacturing processes.
Latest Patents
One of Finlay's notable patents is focused on the uniformity control of metal-based photoresists. This invention involves an EUV photoresist composition that includes paramagnetic particles designed to block EUV radiation. The magnetic manipulation of these particles within a deposited layer can improve focus control and reduce line width roughness during photolithographic processing. Additionally, he developed a spin-coating apparatus that utilizes concentric electromagnets to influence the distribution of paramagnetic particles in the photoresist layer.
Another significant patent by Finlay is a gas flow process control system that incorporates crystal microbalances. This system allows for real-time monitoring of gas flow rates, which can indicate potential gas contamination. The controller can respond by stopping the gas flow or adjusting it to ensure desired results within the processing chamber. This innovation provides precise measurements for process monitoring at minimal costs.
Career Highlights
Throughout his career, Robert Finlay has worked with prominent companies such as GlobalFoundries Inc. and GlobalFoundries U.S. Inc. His contributions to these organizations have been instrumental in advancing their technological capabilities and improving manufacturing processes.
Collaborations
Finlay has collaborated with notable professionals in his field, including Yunsheng Song and Erik Robert Hosler. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in semiconductor manufacturing.
Conclusion
Robert Finlay's innovative contributions to the field of photoresist technology and gas flow process control systems have made a significant impact on the semiconductor industry. His patents reflect a commitment to enhancing manufacturing precision and efficiency.