The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 2019

Filed:

Sep. 22, 2016
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Robert B. Finlay, Ballston Lake, NY (US);

Brian Conerney, Ballston Lake, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01F 1/66 (2006.01); C23C 16/52 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); C23C 16/455 (2006.01); H01L 21/311 (2006.01); H01J 37/305 (2006.01); G01F 1/78 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); C23C 16/45544 (2013.01); C23C 16/52 (2013.01); H01J 37/3056 (2013.01); H01L 21/0228 (2013.01); H01L 21/31116 (2013.01); G01F 1/66 (2013.01); G01F 1/662 (2013.01); G01F 1/78 (2013.01);
Abstract

Disclosed are process control systems and methods incorporating a crystal microbalance (CM) (e.g., a quartz crystal microbalance (QCM)) into gas flow line(s) entering and/or exiting a processing chamber. A CM measures the resonance of a quartz crystal sensor contained therein as gas flows over that crystal sensor and can, thereby be used to accurately monitor, in real time, the mass flow rate of the gas. The mass flow rate may indicate that gas contamination has occurred and, in response, a controller can cause the gas flow to stop. Additionally, the mass flow rate may indicate the desired result will not be achieved within the processing chamber and, in response, advanced process control (APC) can be performed (e.g., the controller can adjust the gas flow). CM(s) incorporated into gas flow lines entering and/or exiting a processing chamber can provide precise measurements for process monitoring at minimal cost.


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