Robert F Sarkozy

Title: The Innovative Contributions of Robert F Sarkozy

Introduction

Robert F Sarkozy is a notable inventor based in Westford, MA, with a remarkable portfolio of six patents. His work primarily focuses on advancements in chemical vapor deposition and semiconductor processing technologies. Sarkozy's inventions have significantly contributed to the efficiency and effectiveness of these processes.

Latest Patents

One of his latest patents is the "Cross-flow diffusion furnace." This invention features a longitudinally extending cross-flow liner within a cylindrical reaction vessel, which works in conjunction with gas injectors to ensure transversely flowing gas across vertically oriented semiconductor wafers. This design aims to eliminate depletion phenomena and downstream wafer pollution, resulting in uniformly coated wafers and improved batch repeatability. Another significant patent is the "Apparatus for chemical vapor deposition with clean effluent and improved." This system includes an inner reactor tube within an outer furnace tube, creating a plenum chamber that enhances gas communication and allows for the effective deposition of materials onto substrates.

Career Highlights

Throughout his career, Robert F Sarkozy has worked with various companies, including Btu Engineering Corporation. His expertise in the field has led to numerous innovations that have advanced semiconductor manufacturing processes.

Collaborations

Sarkozy has collaborated with notable individuals such as Morris Simson and John H Fabricius, contributing to the development of cutting-edge technologies in his field.

Conclusion

Robert F Sarkozy's contributions to the field of semiconductor technology and chemical vapor deposition are significant. His innovative patents reflect his commitment to improving manufacturing processes and enhancing product quality.