The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 1988
Filed:
Dec. 10, 1987
Robert F Sarkozy, Westford, MA (US);
Other;
Abstract
A system for chemical vapor deposition of a material onto the surface of a substrate wherein an inner reactor tube is disposed within an outer furnace tube to provide a plenum chamber between the two tubes. The reactor tube is provided with a series of axially arranged openings to provide gas communication between the inside of the reactor tube and the plenum chamber. Structure is provided for introducing a first reactant gas into the plenum chamber from which a portion passes into the reactor chamber and structure is provided for introducing a second reactant gas directly into the reactor chamber, where a portion reacts with the first reactant gas to deposit a layer of material on substrates present in the reactor chamber. Separate lines are provided for exhausting unreacted first reactant gases from the plenum chamber and for exhausting unreacted second reactant gases from the reaction chamber.