The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 1989
Filed:
Nov. 02, 1987
Morris Simson, Framingham, MA (US);
John H Fabricius, Westford, MA (US);
Ronnie Browne, Derby, NH (US);
Arthur Waugh, Winchester, MA (US);
Robert F Sarkozy, Westford, MA (US);
Chiu K Lai, Wellesley, MA (US);
BTU Engineering Corporation, North Billerica, MA (US);
Abstract
A longitudinally extending cross-flow liner within a longitudinally extending cylindrical reaction vessel cooperates with at least one longitudinally extending gas injector within the cross-flow liner to provide transversely flowing gas across the surfaces of vertically oriented semiconductor wafers in such a way as to substantially eliminate both depletion phenomenon and downstream wafer pollution caused from particulates, unreacted reactant gas, and other contaminants and to provide uniformly coated wafers in a batch and repeatability batch to batch.