Robert Dolan

Title: Innovations of Robert Dolan

Introduction

Robert Dolan is a notable inventor based in Hudson, NH (US), recognized for his contributions to the field of semiconductor technology. With a total of five patents to his name, Dolan has made significant advancements in ion implantation systems and semiconductor-on-insulator structures.

Latest Patents

One of Dolan's latest patents is focused on SIMOX using controlled water vapor for oxygen implants. This invention describes an ion implantation system designed to produce silicon wafers with relatively low defect densities. The system includes a fluid port in the ion implantation chamber that introduces a background gas, such as water vapor, during the ion implantation process. This innovative approach effectively reduces the defect density of the top silicon layer, which is separated from the buried silicon dioxide layer.

Another significant patent involves an implantation process using substoichiometric oxygen doses at different energies. This method provides a way to create high-quality semiconductor-on-insulator structures, specifically silicon-on-insulator structures. The process employs sequential steps of ion implantation and high-temperature annealing, resulting in structures with a top silicon layer thickness ranging from 10-250 nm and a buried oxide layer thickness of 30-300 nm. The buried oxide layer exhibits a breakdown field greater than 5 MV/cm, and the density of silicon inclusions in the BOX region is less than 2×10 cm.

Career Highlights

Dolan's career is marked by his work at Ibis Technology Corporation, where he has played a pivotal role in advancing semiconductor technologies. His innovative approaches have contributed to the development of high-quality semiconductor materials that are essential for modern electronic devices.

Collaborations

Dolan has collaborated with several professionals in his field, including Maria J Anc and Bernhardt F Cordts, III. These collaborations have further enhanced his research and development efforts, leading to groundbreaking innovations in semiconductor technology.

Conclusion

Robert Dolan's contributions to the field of semiconductor technology through his patents and work at Ibis Technology Corporation highlight his role as a leading inventor. His innovative methods and collaborative efforts continue to shape the future of semiconductor applications.