Robert D Patraw

Title: Robert D. Patraw: Innovator in Integrated Circuitry

Introduction

Robert D. Patraw, an accomplished inventor based in Boise, Idaho, has made significant contributions to the field of integrated circuitry with his nine patents. His work is essential in advancing semiconductor technology, particularly in the methods of forming trench isolation, which is crucial for enhancing the performance of integrated circuits.

Latest Patents

Patraw's latest patents involve advanced techniques in the fabrication of integrated circuitry. Notably, he has devised methods that include the formation of first and second isolation trenches in semiconductive materials of semiconductor substrates. The first isolation trench is characterized by having a narrower outermost cross-sectional dimension compared to the second isolation trench. An insulative layer made from silicon dioxide is deposited to fill the first trench while leaving the second trench partially filled. Additionally, a spin-on-dielectric is used to effectively fill the remaining volume of the second isolation trench, which is subsequently densified. These patents represent a significant advancement in semiconductor manufacturing processes, contributing to improved efficiency and performance in integrated circuits.

Career Highlights

Robert Patraw is currently affiliated with Micron Technology Incorporated, where he applies his expertise in semiconductor technology. His innovations have helped to enhance the capabilities of integrated circuits, making them more efficient and reliable. His extensive patent portfolio reflects his commitment to advancing technology and his role as a leader in the industry.

Collaborations

Throughout his career, Patraw has collaborated with notable colleagues such as Michael A. Walker and Jigish D. Trivedi. These partnerships have fostered great synergies in research and development efforts, leading to innovative solutions that continue to benefit the semiconductor industry.

Conclusion

Robert D. Patraw stands out as a prominent figure in the field of integrated circuitry. His nine patents, particularly in trench isolation and fabrication methods, showcase his dedication to innovation and the advancement of technology. As he continues to work with Micron Technology Incorporated, his contributions are sure to leave a lasting impact on the industry and inspire future generations of inventors.