Company Filing History:
Years Active: 1997-2005
Title: The Innovative Contributions of Robert D. Mailho
Introduction
Robert D. Mailho is a prominent inventor based in Sonora, California, known for his significant contributions to the field of semiconductor technology. With a total of seven patents to his name, he has made remarkable advancements in the methods and systems for epitaxial deposition of films on semiconductor substrates. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Among his latest patents, Mailho has developed systems and methods for epitaxially depositing films on a semiconductor substrate. This invention includes a reactor with a hot wall process cavity, which is enclosed by a heater system and thermal insulation. The walls of the process cavity are made from materials like quartz and silicon carbide, which have a similar coefficient of thermal expansion as the semiconductor substrate. This design allows for heating to temperatures as high as 1200 degrees Celsius. The process gases are injected through multiple ports, ensuring precise distribution control of gas components, including film source gas, dopant source gas, and carrier gas. Another notable patent focuses on a thermal processing system for semiconductor substrates, which improves temperature uniformity during the chemical vapor deposition (CVD) process by adjusting the spacing between the inductor and the susceptor.
Career Highlights
Mailho has had a distinguished career, working with notable companies such as Mattson Technology, Inc. His expertise in semiconductor technology has allowed him to contribute to various innovative projects that have advanced the industry.
Collaborations
Throughout his career, Mailho has collaborated with esteemed colleagues, including Joseph H. MacLeish and Mahesh K. Sanganeria. These collaborations have fostered a creative environment that has led to significant technological advancements.
Conclusion
Robert D. Mailho's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the development of advanced manufacturing processes in the semiconductor industry.
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