Company Filing History:
Years Active: 2004-2011
Title: Inventor Profile: Robert Boone from Grenoble, France
Introduction
Robert Boone is a distinguished inventor based in Grenoble, France, recognized for his contributions to semiconductor technology. With a total of three patents to his name, Boone has made significant strides in enhancing the manufacturability and performance of semiconductor devices.
Latest Patents
Among his latest innovations, Boone developed a "Method for forming a semiconductor device using optical proximity correction for the optical lithography." This method involves conducting a first optimization of an edge location of a feature fragment at a faster speed, followed by a second, slower optimization. The results assist in creating a reticle pattern, crucial for patterning layers on semiconductor wafers.
Another notable patent is "Layout modification using multilayer-based constraints." This patent presents a method that improves design manufacturability by performing checks on multiple interacting layers within a layout design. The resulting data helps modify feature edges to minimize the risk of patterns being smaller than intended, ultimately ensuring the integrity of the manufactured design.
Career Highlights
Robert Boone is currently affiliated with Freescale Semiconductor, Inc., where he leverages his expertise in semiconductor device manufacture and design improvement. His hands-on experience has positioned him as a key figure in advancing the field of semiconductor technology.
Collaborations
Throughout his career, Boone has collaborated with notable colleagues, including Kevin Dean Lucas and Mehul D. Shroff. These partnerships have contributed to innovative solutions that address complex challenges in semiconductor manufacturing.
Conclusion
Robert Boone stands out as a pioneer in the semiconductor industry, with his innovative methods continuing to shape the future of device manufacturing. His patents reflect a commitment to quality and practicality, ensuring that advancements in technology keep pace with design needs.