The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2011
Filed:
Oct. 28, 2005
Kevin Lucas, Meylan, FR;
Robert Boone, Grenoble, FR;
Karl Wimmer, Venon, FR;
Christian Gardin, Lancey, FR;
Kevin Lucas, Meylan, FR;
Robert Boone, Grenoble, FR;
Karl Wimmer, Venon, FR;
Christian Gardin, Lancey, FR;
Freescale Semiconductor, Inc., Austin, TX (US);
Abstract
A method for forming a semiconductor device includes performing a first optimization of a first edge location of a feature fragment, wherein the first optimization has a first speed per fragment, and performing a second optimization of a second edge location of the feature fragment, wherein the second optimization has a second speed per fragment that is slower than the first speed per fragment. Next, a result of the second optimization is used to form a reticle pattern; and a layer on a semiconductor wafer is patterned using the reticle pattern.