Rikita Tsunoda

Title: Rikita Tsunoda: Innovator in Resist Pattern Technology

Introduction

Rikita Tsunoda is a prominent inventor based in Kawasaki, Japan. She has made significant contributions to the field of resist pattern technology, holding a total of 5 patents. Her innovative methods have advanced the processes involved in semiconductor manufacturing.

Latest Patents

Among her latest patents is a method of recovering a defect portion of a resist pattern formed on a substrate. This method involves applying a shrinking agent composition to cover the resist pattern with defects, forming a developing solution-insoluble region, and subsequently developing the covered resist pattern. The shrinking agent composition includes a polymeric compound that is either a homopolymer or a random copolymer. Another notable patent is a method of forming a resist pattern, which includes several steps: forming a first resist pattern on a substrate, applying a basic composition to cover it, neutralizing the base contained in the composition with the first resist pattern, and developing the covered first resist pattern. This method utilizes a basic component that contains a polymeric compound with specific structural units.

Career Highlights

Rikita Tsunoda works at Tokyo Ohka Kogyo Co., Ltd., a company known for its innovations in the chemical industry, particularly in materials for semiconductor manufacturing. Her work has been instrumental in enhancing the efficiency and effectiveness of resist pattern technologies.

Collaborations

Throughout her career, Rikita has collaborated with notable colleagues, including Junichi Tsuchiya and Takayoshi Mori. These collaborations have fostered a creative environment that has led to significant advancements in their field.

Conclusion

Rikita Tsunoda's contributions to resist pattern technology exemplify her innovative spirit and dedication to advancing semiconductor manufacturing processes. Her patents reflect her expertise and commitment to excellence in her field.