Richard Ulrich Assion

Title: Richard Ulrich Assion: Innovator in Molybdenum Film Deposition

Introduction

Richard Ulrich Assion is a notable inventor based in Danbury, CT (US). He has made significant contributions to the field of material science, particularly in the deposition of molybdenum films. With a total of 2 patents, Assion's work has advanced the methods used in chemical vapor deposition processes.

Latest Patents

Assion's latest patents include innovative methods for forming molybdenum-containing materials. One patent describes a process for CVD Mo deposition using molybdenum oxytetrachloride (MoOCl) vapor. This method allows for the deposition of molybdenum on a substrate under specific vapor deposition conditions. The process can utilize a diborane contact to create favorable nucleation conditions for subsequent bulk deposition of molybdenum through techniques such as pulsed CVD.

Another significant patent focuses on low-temperature molybdenum film deposition utilizing boron nucleation layers. This method results in molybdenum films that exhibit low electrical resistivity and are substantially free of boron. The process can be conducted at reduced temperatures compared to traditional chemical vapor deposition methods. The molybdenum nucleation layer formed protects the substrate from etching effects and facilitates the nucleation of subsequent CVD Mo growth.

Career Highlights

Richard Ulrich Assion is currently employed at Entegris, Inc., where he continues to innovate in the field of material science. His work has been instrumental in developing new techniques that enhance the efficiency and effectiveness of molybdenum film deposition.

Collaborations

Assion has collaborated with notable colleagues, including Shuang Meng and Thomas H Baum. These partnerships have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Richard Ulrich Assion is a prominent figure in the field of molybdenum film deposition, with a focus on innovative methods that improve material properties and deposition techniques. His contributions through patents and collaborations continue to influence advancements in material science.