The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2021

Filed:

Apr. 26, 2018
Applicant:

Entegris, Inc., Billerica, MA (US);

Inventors:

Thomas H. Baum, Billerica, MA (US);

Philip S. H. Chen, Billerica, MA (US);

Robert L. Wright, Billerica, MA (US);

Bryan Hendrix, Billerica, MA (US);

Shuang Meng, Billerica, MA (US);

Richard Assion, Billerica, MA (US);

Assignee:

ENTEGRIS, INC., Billerica, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/06 (2006.01); C23C 16/455 (2006.01); H01L 21/768 (2006.01); H01L 21/285 (2006.01); C23C 16/02 (2006.01); C23C 16/04 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02175 (2013.01); C23C 16/0272 (2013.01); C23C 16/045 (2013.01); C23C 16/06 (2013.01); C23C 16/45523 (2013.01); H01L 21/0228 (2013.01); H01L 21/02205 (2013.01); H01L 21/28556 (2013.01); H01L 21/76876 (2013.01); H01L 21/76877 (2013.01); H01L 23/53257 (2013.01);
Abstract

A method of forming a molybdenum-containing material on a substrate is described, in which the substrate is contacted with molybdenum oxytetrachloride (MoOCl) vapor under vapor deposition conditions, to deposit the molybdenum-containing material on the substrate. In various implementations, a diborane contact of the substrate may be employed to establish favorable nucleation conditions for the subsequent bulk deposition of molybdenum, e.g., by chemical vapor deposition (CVD) techniques such as pulsed CVD.


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