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For the Inventor, By the Inventor

Mission Viejo, CA, United States of America

Richard M Lazarus

USPTO Granted Patents = 13

Average Co-Inventor Count = 3.1

ph-index = 6

Forward Citations = 112(Granted Patents)


Company Filing History:

goldMedal10 out of 665 
 
Morton International, Inc.
 patents
silverMedal3 out of 211 
 
Morton Thiokol Inc.
 patents

Years Active: 1989-1994

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13 patents (USPTO):Explore Patents
1. 5342734 - Deep UV sensitive photoresist resistant to latent image decay (1994-08-30),
2. 5314782 - Deep UV sensitive resistant to latent image decay comprising a (1994-05-24),
3. 5225312 - Positive photoresist containing dyes (1993-07-06),
4. 5208138 - High contrast high thermal stability positive photoresists having (1993-05-04),
5. 5182184 - Novolak resins of lowered hydroxyl content and high contrast high (1993-01-26),
6. 5130409 - Mixed aldehyde novolak resins useful as high contrast high thermal (1992-07-14),
7. 5126230 - High contrast, positive photoresist developer containing alkanolamine (1992-06-30),
8. 5094934 - Method of developing a high contrast, positive photoresist using a (1992-03-10),
9. 4997734 - Method of forming a thermally stable mixed aldehyde novolak resin (1991-03-05),
10. 4996122 - Method of forming resist pattern and thermally stable and highly (1991-02-26),
11. 4943511 - High sensitivity mid and deep UV resist (1990-07-24),
12. 4920028 - High contrast high thermal stability positive photoresists with mixed (1990-04-24),
13. 4808513 - Method of developing a high contrast, positive photoresist using a (1989-02-28),

Title: The Innovative Contributions of Richard M. Lazarus

Introduction

Richard M. Lazarus is a notable inventor based in Mission Viejo, CA. He has made significant contributions to the field of photoresist technology, holding a total of 13 patents. His work has been instrumental in advancing the capabilities of materials used in various applications.

Latest Patents

Among his latest patents, Richard has developed a deep UV sensitive photoresist resistant to latent image decay. This positive working photoresist provides improved critical dimension stability during prolonged periods of post-exposure delay before baking. It comprises an acid-stable polymer that is insoluble in water but normally soluble in an aqueous alkaline medium, a photoinitiator that generates acid upon exposure to actinic radiation, and a mixed carbonate ester of tertiary butyl alcohol and a polyhydric phenol. Another notable patent involves a similar deep UV sensitive photoresist, which also enhances critical dimension stability and includes a photo acid generator exemplified by the tri-(2,1,4-diazonaphthoquinonesulfonate) ester of 3,5-dinitro-2,6-dimethylol para cresol.

Career Highlights

Richard has worked with prominent companies such as Morton International, Inc. and Morton Thiokol Inc. His experience in these organizations has allowed him to refine his expertise in photoresist technology and contribute to various innovative projects.

Collaborations

Throughout his career, Richard has collaborated with talented individuals, including Sunit S. Dixit and Randall M. Kautz. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Richard M. Lazarus is a distinguished inventor whose work in photoresist technology has had a lasting impact on the industry. His innovative patents and collaborations highlight his commitment to advancing technology and improving material performance.

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