Richard L Bersin

Title: Innovations by Richard L Bersin

Introduction

Richard L Bersin is a notable inventor based in Lawrence, MA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work primarily focuses on methods for cleaning and stripping photoresist from semiconductor surfaces.

Latest Patents

One of his latest patents involves a process for cleaning and stripping photoresist from surfaces of semiconductors using a microwave downstream process. In this innovative method, a microwave plasma is formed from a gas containing a small quantity of fluorine, which enhances ashing without substantial oxide loss. This process can be performed before or after other microwave downstream processes or reactive ion etching processes. Another patent describes a method for removing a resist layer, particularly in via holes. This method includes using plasma to remove organic compounds, rinsing the device in deionized water, and sputtering with argon to eliminate inorganic compounds. Notably, the order of rinsing and sputtering can be reversed, and these methods avoid the use of acids and industrial solvents.

Career Highlights

Richard L Bersin is currently employed at Ulvac Technologies, Inc., where he continues to innovate in the semiconductor field. His expertise and contributions have been instrumental in advancing cleaning processes for semiconductor manufacturing.

Collaborations

He has collaborated with notable coworkers, including Han Xu and Izumi Nakayama, who share his commitment to innovation in semiconductor technology.

Conclusion

Richard L Bersin's work exemplifies the spirit of innovation in the semiconductor industry. His patents reflect a dedication to improving processes that enhance efficiency and safety in semiconductor manufacturing.