The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 1998
Filed:
Oct. 16, 1996
Applicant:
Inventors:
Izumi Nakayama, Groton, MA (US);
Yukio Masuda, North Andover, MA (US);
Richard L Bersin, Boxford, MA (US);
Han Xu, Lexington, MA (US);
Quain Geng, Acton, MA (US);
Assignee:
Ulvac Technologies, Inc., Andover, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
438714 ; 438715 ; 438725 ; 438727 ; 438734 ; 156345 ;
Abstract
A method for removing a resist layer includes an RIE process and a downstream microwave process, each performed such that the temperature of the wafer is no greater than about 60.degree. C. By performing these processes cold, the resist need not be pre-heated to drive off solvents. The RIE process and the microwave process can be performed sequentially or simultaneously.