Richard Douglas Stokes

Title: Richard Douglas Stokes: Innovator in Semiconductor Technology

Introduction

Richard Douglas Stokes is a notable inventor based in Shavertown, PA (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches to MOS-gated semiconductor devices.

Latest Patents

Stokes' latest patents include a method of making a MOS-gated semiconductor device with a single diffusion. This method involves implanting arsenic and boron dopants through a mask to create distinct layers, followed by a single diffusion step that simultaneously diffuses both dopants. His other patent, a method of making MOS-gated semiconductor devices, describes a gate electrode control structure that includes four doped regions. This structure is fabricated using self-alignment doping processes, enhancing precision in defining the spacing between regions.

Career Highlights

Throughout his career, Richard Douglas Stokes has worked with various companies, including Harris Corporation. His work has significantly impacted the development of semiconductor technologies, particularly in the area of MOS-gated devices.

Collaborations

Stokes has collaborated with notable individuals in his field, including John M Neilson and Linda Susan Brush. Their combined expertise has contributed to advancements in semiconductor technology.

Conclusion

Richard Douglas Stokes is a distinguished inventor whose work in semiconductor technology has led to innovative methods and structures that enhance device performance. His contributions continue to influence the industry and inspire future innovations.