This inventor holds 7 USPTO granted patents and 2 EPO patents. Top assignee: International Business Machines Corporation. Active years: 1999-2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Schonenberg, CH (1999)
- Schoenenberg, CH (2004 - 2011)
Company Filing History:
Years Active: 1999-2011
Title: The Innovative Mind of Reto R. Schlittler
Introduction
Reto R. Schlittler, based in Schonenberg, Switzerland, is a prominent inventor known for his significant contributions to the field of technology. With a total of seven patents to his name, he has developed innovative devices and methods that are paving the way for advances in substrate patterning.
Latest Patents
Among Reto Schlittler’s latest patents is a groundbreaking device and method for patterning structures on a substrate. This invention features an imaging device equipped with a scanning tip and a light-emitting device, incorporating a space filled with vapor of a chemical vapor deposition material. The design allows for the decomposition of the vapor through an electromagnetic field generated by a carefully directed light beam.
Additionally, Reto has also been involved in the development of methods and apparatus for defining patterns on a substrate. This apparatus includes an emission source, shadow masks with apertures, and an inspection device equipped with inspection tools. Notably, both the shadow mask and inspection tool are mounted on a movable portion, allowing them to be positioned sequentially for enhanced precision in pattern definition.
Career Highlights
Reto Schlittler's influential role at International Business Machines Corporation (IBM) has enabled him to make considerable strides in the field of substrate technology. His research and inventions highlight his dedication to finding innovative solutions and enhancing technological applications within the industry.
Collaborations
During his career, Reto has collaborated with esteemed colleagues such as Urs T. Duerig and Walter Heinrich Riess. These partnerships have fostered a creative environment, turning groundbreaking ideas into practical applications that benefit the broader technology community.
Conclusion
Reto R. Schlittler stands out as an inventive force, with his work significantly impacting the area of substrate patterning. Through his patents and collaborations, he exemplifies the essence of innovation and continues to inspire future advancements in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile