The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2008
Filed:
Jun. 16, 2005
Gerhard Meyer, Adliswil, CH;
Hanspeter Ott, Thalwil, CH;
Reto Schlittler, Schoenenberg, CH;
Percy Zahl, Adliswil, CH;
Gerhard Meyer, Adliswil, CH;
Hanspeter Ott, Thalwil, CH;
Reto Schlittler, Schoenenberg, CH;
Percy Zahl, Adliswil, CH;
International Business Machines Corporation, Armonk, NY (US);
Abstract
The invention provides methods and apparatus for defining a pattern on a substrate. An example apparatus includes: an emission source for directing an emission to the substrate, defining a working position between the emission source and the substrate, at least one shadow mask having one or more apertures and at least one inspection device for inspecting the properties of the substrate and/or the pattern, the inspection device having at least one inspection tool. The shadow mask and the inspection tool are separately provided on a movable portion, so that the shadow mask and the inspection tool are subsequently movable into the working position. The invention is further related to a method for defining a pattern on a substrate.