The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2011

Filed:

Nov. 09, 2004
Applicants:

Siegfried F. Karg, Adliswil, CH;

Roland Germann, Wangen, CH;

Heike E. Riel, Rueschlikon, CH;

Walter Heinrich Riess, Thalwil, CH;

Reto Schlittler, Schoenenberg, CH;

Inventors:

Siegfried F. Karg, Adliswil, CH;

Roland Germann, Wangen, CH;

Heike E. Riel, Rueschlikon, CH;

Walter Heinrich Riess, Thalwil, CH;

Reto Schlittler, Schoenenberg, CH;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 8/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A device for patterning structures on a substrate includes an imaging device having a scanning tip, a light emitting device, and a space around the scanning tip. The space comprises a vapor of a material which is suitable for Chemical Vapor Deposition onto the substrate when decomposed. The light emitting device is adapted to emit a light beam, which has an intensity not capable to decompose the vapor, onto the scanning tip in such a way that an electromagnetic field induced by the light beam near the scanning tip is high enough to decompose the vapor.


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