Ren-Yu Chang

Title: Ren-Yu Chang: Innovator in Semiconductor Technology

Introduction

Ren-Yu Chang is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative methods and processes that enhance semiconductor structures and devices.

Latest Patents

Ren-Yu Chang's latest patents include the "Edge fin trim process," which provides methods for forming semiconductor fins over a substrate. This process involves removing an outer semiconductor fin and forming a gate structure over the remaining fins. The method ensures that the plurality of semiconductor fins includes more than three fins, optimizing the overall structure. Another notable patent is the "Method of forming protection layer in FinFET device." This invention describes a fin-based transistor that includes laterally spaced fins, each doped with different types of dopants. A protection layer made from dielectric materials is formed over these fins, enhancing the device's performance.

Career Highlights

Ren-Yu Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to the advancement of semiconductor technologies.

Collaborations

Ren-Yu Chang has collaborated with notable colleagues, including Jen-Chun Chou and Yu-Chiang Chou. These partnerships have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Ren-Yu Chang's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor structures and methods.