This inventor holds 2 USPTO granted patents and 3 published patent applications and 3 EPO patents. Top assignee: Alpha Assembly Solutions Inc.. Active years: 2024-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024-2026
Title: The Innovative Journey of Remya Chandran in Nano Technology
Introduction
Remya Chandran, an esteemed inventor based in Waterbury, Connecticut, has made significant strides in the innovation sector. With a strong focus on nano technology, she has developed a patented technology that stands to impact the way electronic components are manufactured and attached.
Latest Patents
Chandran holds a patent for "Nano copper paste and film for sintered die attach and similar applications". This cutting-edge invention includes a sintering powder composed of copper particles that are at least partially coated with a capping agent. The particles are characterized by a D10 size greater than or equal to 100 nm and a D90 size of less than or equal to 2000 nm, making it highly effective for advanced applications in electronics.
Career Highlights
Currently, Remya is associated with Alpha Assembly Solutions Inc., where she applies her expertise in nano materials to drive innovation. Her work focuses on enhancing manufacturing processes, ensuring that electronic components are securely and efficiently attached.
Collaborations
Throughout her career, Chandran has collaborated with notable professionals, including her colleagues Shamik Ghosal and Venodh Manoharan. These collaborations have fostered an environment of shared knowledge and innovation, further propelling advancements in the field of nano technology.
Conclusion
Remya Chandran’s contributions to the realm of nano technology exemplify the spirit of innovation. Through her patented work at Alpha Assembly Solutions Inc., she is helping pave the way for more efficient manufacturing processes in electronics. As she continues her journey, we can expect her to remain a key figure in technological advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile