Ray Ellis

Title: Ray Ellis: Innovator in Substrate Measurement Technologies

Introduction

Ray Ellis is a notable inventor based in Fremont, California, recognized for his contributions to substrate measurement technologies. With a total of six patents to his name, Ellis has made significant advancements in methods and apparatuses for positioning substrates in various applications.

Latest Patents

Among his latest patents is the invention titled "Substrate-alignment using detector of substrate material." This patent describes methods and apparatuses for positioning a substrate that may have a target located on either its front-side or backside. The optical detector utilized in this invention contains a signal-generating material that is substantially identical to the substrate material. Another significant patent is "Dual-sided substrate measurement apparatus and methods," which discloses an apparatus for measuring the relative positions of frontside and backside alignment marks located on opposite sides of a substrate. This apparatus includes upper and lower optical systems that allow for simultaneous imaging of the alignment marks, enabling precise measurements of alignment and overlay performance.

Career Highlights

Throughout his career, Ray Ellis has worked with several companies, including Ultratech, Inc. and Peer Intellectual Property Inc. His experience in these organizations has contributed to his expertise in the field of substrate measurement technologies.

Collaborations

Ellis has collaborated with notable individuals in his field, including Emily M True and Albert J Crespin. These collaborations have likely enriched his work and led to innovative solutions in substrate alignment and measurement.

Conclusion

Ray Ellis stands out as an influential inventor in the realm of substrate measurement technologies. His patents reflect a commitment to advancing the precision and efficiency of substrate positioning methods.