Hsinchu, Taiwan

Rann-Shyan Yeh


Average Co-Inventor Count = 7.2

ph-index = 2

Forward Citations = 29(Granted Patents)


Company Filing History:


Years Active: 2007-2009

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Rann-Shyan Yeh in Semiconductor Technology

Introduction: Rann-Shyan Yeh, an accomplished inventor based in Hsinchu, Taiwan, has made significant strides in the field of semiconductor technology. With two patents to his name, he is recognized for his innovative approaches to isolating integrated circuits and improving high-voltage transistor devices.

Latest Patents: One of Rann-Shyan Yeh's most notable patents is the "Semiconductor structure for isolating integrated circuits of various operating voltages." This invention features a unique semiconductor structure that effectively isolates circuits of different operating voltages using a first isolation ring and a buried layer. These components work together to enhance the performance and reliability of integrated circuits on a semiconductor substrate.

His second patent, titled "High-voltage transistor device having an interlayer dielectric etch stop layer for preventing leakage and improving breakdown voltage," focuses on a high-voltage transistor device that incorporates an etch stop layer. This layer is designed to prevent leakage and improve breakdown voltage for devices operating at voltages greater than 5 volts, while still being compatible with existing fabrication processes.

Career Highlights: Rann-Shyan Yeh is currently associated with Taiwan Semiconductor Manufacturing Company Ltd., a global leader in the semiconductor industry. His work there emphasizes the advancement of cutting-edge technologies crucial for modern electronics.

Collaborations: Throughout his career, Rann-Shyan Yeh has collaborated with talented professionals such as Chung-I Chen and Chi-Hsuen Chang. Their collective expertise has contributed to the successful development of innovative semiconductor technologies.

Conclusion: Rann-Shyan Yeh’s contributions to the field of semiconductor technology are invaluable. His patents reflect a commitment to innovation and excellence, addressing key challenges in the semiconductor industry and paving the way for future advancements.

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