Randal L Campbell

Title: Randal L Campbell: Innovator in Photoresist Technologies

Introduction

Randal L Campbell is a notable inventor based in New Alexandria, PA (US). He has made significant contributions to the field of photoresist technologies, holding 2 patents that enhance processing times and improve the efficiency of photoresist applications.

Latest Patents

One of his latest patents is focused on positive photoresist compositions having enhanced processing time. This innovation involves novel compositions that comprise photoactive polymers with a dinitrobenzyl group in conjunction with a photoacid generator. In one embodiment, the photoacid generator is a diazide and/or a sulfonyl aceto carbonyl compound. These photoacid generators are typically used in amounts of 10 weight percent or less. The compositions are particularly useful in creating storage stable, pH stable, and water stable positive photoresist compositions. They demonstrate reduced process time compared to similar compositions that lack the photoacid generator. Additionally, methods for using these compositions are disclosed.

Another significant patent by Campbell is related to the method of treating photoresists using electrodeless UV lamps. This method involves exposing a photoresist to light from an electrodeless UV bulb, which is applicable to both positive and negative photoresists. For positive photoresists, the use of electrodeless UV lamps significantly reduces the UV exposure time. The patent also includes methods for making circuit boards and apparatus for making circuit boards.

Career Highlights

Randal L Campbell is currently associated with PPG Industries Ohio, Inc., where he continues to innovate in the field of photoresist technologies. His work has contributed to advancements that benefit various applications in the electronics industry.

Collaborations

Throughout his career, Campbell has collaborated with notable colleagues, including James E Jones and David A Diehl. These collaborations have fostered an environment of innovation and have led to the development of impactful technologies.

Conclusion

Randal L Campbell is a distinguished inventor whose work in photoresist technologies has made a significant impact on the industry. His patents reflect a commitment to enhancing processing times and improving the efficiency of photoresist applications.