Ppg Industries Ohio, Inc.

Randal L Campbell

James E Jones

Ronald R Ambrose

David A Diehl

Ljiljana Maksimovic

Gerald W Gruber

Novel compositions comprising photoactive polymers comprising a dinitrobenzyl group in conjunction with a photoacid generator are disclosed. In one embodiment, the photoacid generator is a diazide and/or a sulfonyl aceto carbonyl compound. The photoacid generators are typically used in amounts of 10 weight percent or less. The compositions find particular application in storage stable, pH stable, and water stable positive photoresist compositions. Such compositions demonstrate reduced process time as compared with similar compositions lacking the photoacid generator. Methods for using these compositions are also disclosed.

Positive photoresist compositions having enhanced processing time

Methods for treating a photoresist by exposure to light from an electrodeless UV bulb are disclosed. The methods are applicable to both positive and negative photoresists. In the case of positive photoresists, use of electrodeless UV lamps significantly reduces the UV exposure time. Methods for making circuit boards and apparatus for making circuit boards are also disclosed.

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New Alexandria, PA, United States of America

Randal L Campbell