San Jose, CA, United States of America

Rana Howlader

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rana Howlader. Retrieved from https://idiyas.com/inventor/rana-howlader

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 66.7

Average Co-Inventor Count = 7.1

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • San Jose, CA (US) (2022)
  • Santa Clara, CA (US) (2023)

Company Filing History:


Years Active: 2022-2026

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3 patents (USPTO):Explore Patents

Title: Innovations by Rana Howlader

Introduction

Rana Howlader is an accomplished inventor based in San Jose, CA. He has made significant contributions to the field of semiconductor processing, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

One of Rana's latest patents is titled "Power supply signal conditioning for an electrostatic chuck." This invention involves exemplary semiconductor processing systems that include a processing chamber and an electrostatic chuck. The electrostatic chuck is designed with at least one electrode and a heater. The system features a power supply that provides a signal to the electrode, generating electrostatic force to secure a substrate. Additionally, a filter is integrated to remove or reduce noise introduced into the chucking signal by the heater, ensuring stable operation.

Another notable patent is "Methods for selective deposition of dielectric on silicon oxide." This patent describes innovative methods for selectively depositing a film onto a substrate surface. The process involves exposing a substrate to a blocking molecule to create a blocking layer on the first surface. This layer is then treated with a polymer initiator to form a networked blocking layer, which inhibits deposition on the first surface while allowing selective formation on the second surface.

Career Highlights

Rana Howlader is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to contribute to cutting-edge technologies that drive advancements in semiconductor manufacturing.

Collaborations

Rana collaborates with talented individuals such as Zheng John Ye and Daemian Raj Benjamin Raj, who contribute to the innovative environment at Applied Materials.

Conclusion

Rana Howlader's contributions to semiconductor processing through his patents and work at Applied Materials highlight his role as a significant innovator in the field. His inventions are paving the way for advancements in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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