Company Filing History:
Years Active: 1986-1987
Title: **The Innovative Contributions of Ramazan Soydan in Silicon Technology**
Introduction
Ramazan Soydan, a talented inventor based in Berkley Township, Ocean County, NJ, has made significant strides in the field of silicon technology. With a total of two patents to his name, he has contributed innovative methods that enhance the manufacturing and application of monocrystalline silicon.
Latest Patents
One of Ramazan Soydan's recent patents, titled "Method of Depositing Uniformly Thick Selective Epitaxial Silicon," details a novel approach for depositing monocrystalline silicon at a uniform rate onto various nucleation sites. This method utilizes a substrate with an apertured oxide mask, allowing for controlled exposure to a mixture of dichlorosilane and hydrogen chloride at elevated temperatures. The process results in the formation of monocrystalline silicon islands with a uniform thickness, essential for advanced semiconductor applications.
Another noteworthy patent is the "Method for Thinning Silicon." This innovative technique involves oxidizing the surface of a silicon layer and subsequently removing the oxide layer to expose the silicon. The method facilitates the creation of a substantially uniformly thinned silicon layer, which is crucial for optimizing device performance in electronic components.
Career Highlights
Ramazan Soydan has applied his expertise at RCA Inc., where he has continued to advance silicon technologies. His innovative work in developing methods for manipulating silicon has paved the way for improvements in various electronic and semiconductor applications.
Collaborations
Throughout his career, Ramazan has collaborated with esteemed colleagues, including Lubomir L. Jastrzebski and John F. Corboy, Jr. These collaborations have enabled him to expand his research and develop cutting-edge solutions that drive technological advancements in the industry.
Conclusion
Ramazan Soydan's contributions to silicon technology highlight the importance of innovation and creativity in the field of materials science. With his patented methods, he continues to influence the development of semiconductors and further the capabilities of modern electronics. His work not only showcases his individual talent but also embodies the collaborative spirit of innovation that drives progress in technology.