Ralph Kerns

Title: Ralph Kerns - Innovator in Semiconductor Processing

Introduction

Ralph Kerns is a notable inventor based in San Carlos, CA (US). He has made significant contributions to the field of semiconductor processing, holding a total of 3 patents. His work focuses on innovative methods for enhancing the fabrication processes of patterned media disks used in hard drives.

Latest Patents

One of Kerns' latest patents is titled "System and method for commercial fabrication of patterned media." This invention provides a modular system for etching patterned media disks without removing them from a vacuum environment. The system allows for specific process sequences, enabling the magnetic stack to be etched in various ways. In some sequences, ion implantation is utilized without etching steps, while a movable non-contact electrode is employed for sputter etching. The substrate is held vertically, allowing both sides to be etched serially in different chambers.

Another significant patent is the "Method for removal of metallic residue after plasma etching of a metal layer." This method addresses the challenge of cleaning substrates in semiconductor processing systems by using a hydrogen fluoride solution to remove metallic residues after plasma etching.

Career Highlights

Throughout his career, Ralph Kerns has worked with various companies, including Applied Materials, Inc. His expertise in semiconductor processing has positioned him as a valuable contributor to the industry.

Collaborations

Kerns has collaborated with notable professionals in his field, including Padmapani Nallan and Ajay Kumar. Their collective efforts have further advanced the technologies related to semiconductor fabrication.

Conclusion

Ralph Kerns is a distinguished inventor whose work in semiconductor processing has led to innovative solutions for the fabrication of patterned media disks. His patents reflect a commitment to improving manufacturing processes in the technology sector.