The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2013
Filed:
Dec. 05, 2008
Kevin P. Fairbairn, Los Gatos, CA (US);
Michael S. Barnes, San Ramon, CA (US);
Terry Bluck, Santa Clara, CA (US);
Ren Xu, San Jose, CA (US);
Charles Liu, Los Altos, CA (US);
Ralph Kerns, San Carlos, CA (US);
Kevin P. Fairbairn, Los Gatos, CA (US);
Michael S. Barnes, San Ramon, CA (US);
Terry Bluck, Santa Clara, CA (US);
Ren Xu, San Jose, CA (US);
Charles Liu, Los Altos, CA (US);
Ralph Kerns, San Carlos, CA (US);
Intevac, Inc., Santa Clara, CA (US);
Abstract
A system is provided for etching patterned media disks for hard drive. The modular system may be tailored to perform specific processes sequences so that a patterned media disk is fabricated without removing the disk from vacuum environment. In some sequence the magnetic stack is etched while in other the etch is performed prior to forming the magnetic stack. In a further sequence ion implantation is used without etching steps. For etching a movable non-contact electrode is utilized to perform sputter etch. The cathode moves to near contact distance to, but not contacting, the substrate so as to couple RF energy to the disk. The substrate is held vertically in a carrier and both sides are etched serially. That is, one side is etched in one chamber and then in the next chamber the second side is etched.